Carbon xps peak series#

He has served as Director for several Centers of Excellence in Materials Research. Recognitions include the European ERC Advanced Grant, a Wallenberg Scholar Grant, the Akzo Nobel Sweden Science Award, and Fellow of the American Vacuum Society. What is XPS X-ray Photoelectron spectroscopy, based on the photoelectric effect, 1,2 was developed in the mid-1960вЂ™s by Kai Siegbahn and his research group at the University of Uppsala, Sweden. He has procured and managed the electron microscopy laboratory at LinkГ¶ping, including the FEI Analytical Monochromated Double-aberration-corrected 60-300 kV Titan 3 high-resolution instrument and its dedicated vibration-free building. His research interest is in materials science and nanotechnology of functional thin film materials. He made a sabbatical at University of Illinois at Urbana-Champaign during 2004-2006.

He received his PhD 1988 and became Professor/Head of Division in Thin Film Physics at IFM, LinkГ¶ping University in 1998 after being a visiting scientist to Northwestern University, USA. He is an elected member of the Royal Swedish Academy of Science (KVA) and Engineering Sciences (IVA), as well as Fellow of the American Vacuum Society and the Forschungszentrum Dresden-Rossendorf. He is leave of absence with time for research from LinkГ¶ping University, Sweden.

He is Chief Executive Officer of The Swedish Foundation for Strategic Research (SSF), since 2013. Lars Hultman, Born 1960 in LinkГ¶ping, Sweden. Our intention is to promote awareness within a growing XPS community as to the problems reported over the last six decades and present a guide with best practice for using the C 1s BE referencing method. Owing to the huge volume of XPS literature produced each year, the consequences of improper referencing are dramatic. The purpose of this review is to critically evaluate the status quo of XPS with a historical perspective, provide the techniqueвЂ™s operating principles, resolve myths associated with C 1s referencing, and offer a comprehensive account of recent findings. Alarmingly, as revealed by our survey of recent XPS literature, the calibration procedure based on the C 1s peak of adventitious carbon is highly arbitrary, which results in incorrect spectral interpretation, contradictory results, and generates a large spread in reported BE values for elements even present in the same chemical state. Despite accumulating criticism, pointing to the unknown origin and composition of the adventitious carbon, this is by far the most commonly used method today for all types of samples, not necessarily electrically insulating. One approach, proposed in the early days of XPS, employs the C 1s spectra of an adventitious carbon layer, which is present on all surfaces exposed to air. The accuracy of chemical-state determination relies, however, on a trustworthy calibration of the binding energy (BE) scale, which is a nontrivial task due to the lack of an internal BE reference. The characteristics of the heterogeneous films are thought to be governed by the higher affinity of PMMA-r-PMAA for the solvent (dioxane), which leads to the elevation of the PS phase compared to the PMMA-r-PMAA phase, and to surface enrichment in PMMA-r-PMAA.With more than 9000 papers published annually, X-ray photoelectron spectroscopy (XPS) is an indispensable technique in modern surface and materials science for the determination of chemical bonding. On the other hand, the surfaces obtained from blends with a low PS content (30/70 to 10/90) display randomly distributed PS islands surrounded by a PMMA-r-PMAA matrix. Combining the information from XPS with atomic force microscopy (AFM) images, water contact angle measurements and PS selective dissolution, it appears that the surfaces obtained from blends with a high PS content (90/10 to 70/30) display pits with a bottom made of PMMA-r-PMAA, randomly distributed in a PS matrix. This is only GO without any dopant or functionalization. I could not find in any literature to which group it is assigned.

The proportion of each polymer at the interface was deduced from X-ray photoelectron spectroscopy (XPS) data using, on the one hand, the O/C ratio, and on the other hand, decomposition of the carbon peak of the blends in two components corresponding to the carbon peaks of PS and PMMA-r-PMAA. XPS of graphene oxide (GO) showed a C1s peak at 282.8 ev. The chosen homopolymer is polystyrene (PS) and the random copolymer is poly(methyl methacrylate)-r-poly(methacrylic acid) (PMMA-r-PMAA), whose acidic functions could be used as reactive sites in view of further surface functionalization.

Carbon xps peak series#

A series of homopolymer/random copolymer blends was used to produce heterogeneous surfaces by demixing in thin films.